IMASH , A.; KUNAKOV , S. Monosilane SiH4 plasma kinetics generated by e-beam and electrons’ energy distribution impact on silicon chemical vapor deposition. BULLETIN OF THE L.N. GUMILYOV EURASIAN NATIONAL UNIVERSITY. PHYSICS. ASTRONOMY SERIES, [S. l.], v. 135, n. 2, p. 57–68, 2022. DOI: 10.32523/2616-6836-2021-135-2-57-68. Disponível em: https://bulphysast.enu.kz/index.php/physast/article/view/55. Acesso em: 4 may. 2024.